CuO Films Obtained by Oxidation of Cu Layers Deposited by the PVD Process - Magnetron Sputtering

The experimental research carried out and described in this paper aimed to obtain thin films from copper oxides and their characterization from the structural point of view and the optical and electrical properties. To obtain the copper films, a PVD spray deposition system was used, consisting of a vacuum chamber with a capacity of 2 liters, a planar magnetron with ferrite magnets (40x22x9) neodymium (15x8), a vacuum pump with sliding blades, a variable source of direct current of voltage 100 - 600 volts. The atmosphere used for plasma maintenance during deposition was argon rarefied in a pressure range between 3·10-2 - 8·10-3 mbar. The deposits were made on glass plates. The films thus obtained were subsequently subjected to oxidation at temperatures of 200, 300 and 450 °C. It was found that the transparency of the films increases with the oxidation temperature from 1.464 * 10-4 for 200 oC to 0.5 for 450 oC and the surface electrical resistance also increases from 0.984 Ώ for 200 oC to 3882857,1428 Ώ for 450 oC. With increasing spray power, transparency and surface strength decrease.