The radiative recombination coefficient and the internal quantum yield of electroluminescence in silicon

The results of the analysis of variations in the radiative recombination coefficient with varying doping level and concentration of excess electron-hole pairs are reported. It is shown that, along with the effect of narrowing of the band gap calculated in the many-electron approximation, the effect of screening of the Coulomb interaction responsible for the decrease in the excition binding energy should be taken into account. Both effects produce similar trends and decrease the radiative recombination coefficient with increasing levels of doping or injection. The contributions of excitonic radiative recombination and band-to-band radiative recombination to the total radiative recombination coefficient are separated from each other. It is shown that, in the region of room temperature, both contributions are comparable, while at liquid-nitrogen temperature, the excitonic component dominates over the band-to-band component. The results obtained by refined calculations of the limiting value of the internal quantum yield of electroluminescence for the silicon diodes and p-i-n structures are presented. It is shown that the internal quantum yield of electroluminescence can be as high as 14%. However, this values sharply decreases with increasing surface recombination rate and decreasing lifetime of excess charge carriers in the bulk.