Electrical and magnetic properties of atomic layer deposited cobalt oxide and zirconium oxide nanolaminates

Abstract Nanolaminates of ZrO 2 and Co 3 O 4 were atomic layer deposited on silicon and titanium nitride at 300 °C. Films were confirmed to be polycrystalline in the as-deposited state, with the cubic phase dominating in both oxides. All films exhibited resistive switching characteristics and charge polarization and ferromagnetic behavior. Also, the relative permittivities of the films were measured and the dispersion functions modelled.