Tailoring particle arrays by isotropic plasma etching: an approach towards percolated perpendicular media
2009
Plasma etching of densely packed arrays of polystyrene particles leads to arrays of spherical
nanostructures with adjustable diameters while keeping the periodicity fixed. A linear
dependence between diameter of the particles and etching time was observed for particles down
to sizes of sub-50 nm. Subsequent deposition of Co/Pt multilayers with perpendicular magnetic
anisotropy onto these patterns leads to an exchange-decoupled, single-domain magnetic
nanostructure array surrounded by a continuous magnetic film. The magnetic reversal
characteristic of the film–particle system is dominated by domain nucleation and domain wall
pinning at the particle locations, creating a percolated perpendicular media system.
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