Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining
2003
To realize submicron focusing of hard X-rays, elliptical mirrors were manufactured using the new fabrication methods of elastic emission machining and plasma chemical vaporization machining. Line foonsed X-ray beam profiles of each mirror was evaluated at the 1-km-long beamline of SPring-8, and this showed nearly diffraction-limited performances were achieved. A Kirkpatrick-Bacz mirror unit equipping an automatic optical alignment system, in which the fabricated mirrors were used, was designed, constructed and confirmed to enable 200 x 200 nm 2 focusing of 15keV X-ray.
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