Metasurface Manufacturing on 300-mm Wafer Platforms

Nanxi Li,Zhengji Xu,Yuan Dong,Ting Hu,Qize Zhong,Yuan-Hsing Fu,Shiyang Zhu,Navab Singh

Metasurface Manufacturing on 300-mm Wafer Platforms

2020

Nanxi Li
Zhengji Xu
Yuan Dong
Ting Hu
Qize Zhong
Yuan-Hsing Fu
Shiyang Zhu
Navab Singh

The CMOS-compatible flat optics fabrication platforms developed within the Institute of Microelectronics (IME) for multi-purpose wafers have been presented. The work aims to drive the flat optics towards the mass-manufacturing and commercialization.

Keywords:

Fabrication
Refractive index
Wafer
Optoelectronics
Microelectronics
Immersion lithography
near infrared radiation
Materials science
Electron-beam lithography
Scanning electron microscope

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