Process kit shield and a physical vapor deposition chamber having a process kit shield

Provided herein process kit shield and includes a process kit shield in a physical vapor deposition (PVD) Embodiment chamber. In some embodiments, a deposition process parts of the first material shield may include an annular body and an etch stop coating in a physical vapor deposition process, the annular body defining an opening of the body is surrounded, wherein the annular body from the first a material the etch stop coating is formed on the surface of the annular body facing the opening in the etch stop coating made from different than the first material, the second material with respect to the first material, the second material having a high etch selectivity.