Conduction disturbances after transcatheter aortic valve implantation

Abstract Since its introduction in 2002, the number of transcatheter aortic valve implantation (TAVI) procedures has grown exponentially. Although technical advances have been made in valve technology and its implantation system, conduction disturbances (CD) remain the most common complication of the procedure. CD have a negative impact on the prognosis of patients for reasons such as the worsening of left ventricular ejection fraction, the need for a pacemaker or the increased risk of sudden cardiac death. Several factors have been associated with higher risk of CD, including prior right bundle-branch block, valve type and deep valve placement inside the left ventricular outflow tract. Whilst CD are the most common complications of TAVI, there is still no general agreement on the optimal strategy to minimize its incidence. In this review we will approach the current evidence for the pathophysiology, incidence, clinical implications and management of CD in TAVI.