Extreme ultraviolet resist outgassing and its effect on nearby optics
2008
Extreme ultraviolet (EUV) photoresists are known to outgas during exposure to EUV radiation in the vacuum
environment. This is of particular concern since some of the outgassed species may contaminate the nearby EUV optics
and cause a loss of reflectivity and therefore throughput of the EUV exposure tools. Due to this issue, work has been
performed to measure the species and quantities that outgas from EUV resists. Additionally, since the goal of these
measurements is to determine the relative safety of various resists near EUV optics, work has been performed to measure
the deposition rate of the outgassed molecules on Mo/Si-coated witness plate samples. The results for various species
and tests show little measurable effect from resist components on optics contamination with modest EUV exposure
doses.
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