Thin films of molecular materials grown on silicon substrates by chemical vapor deposition and electrodeposition

Chemical vapor deposition (CVD) and electrodeposition (ED) were applied to grow thin films of molecule-based magnets and conductors. Chemical vapor deposited films are illustrated by the M(TCNE)x (M=V, Cr, Nb, Mo) magnet series. V(TCNE)x and Cr(TCNE)x are room-temperature magnets. XANES/EXAFS studies on the air-stable Cr(TCNE)x have been performed to determine the chemical environment of the chromium within the polymeric network. Electrodeposition on a silicon working electrode was applied to process thin films of numerous molecule-based conductors, namely, non-integral oxidation state compounds, charge transfer complexes, and singlecomponent molecular conductors. Among the series of conductive thin films, TTF[Ni(dmit)2]2 and Ni(tmdt)2 exhibit a metal-like behavior.