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Effects of rf Bias and Substrate Temperature on Si Substrate Cleaning Using Inductively Coupled Hydrogen Plasma
Effects of rf Bias and Substrate Temperature on Si Substrate Cleaning Using Inductively Coupled Hydrogen Plasma
1997
akira hirosi ikeda
Akihiro Ikeda
satosi iwasaki
Satoru Iwasaki
syuusaku nagasima
Hidenori Nagashima
seiiti oota
Seiichi Ohta
Seiichi Ota
keiiti tukamoto
Keiichi Tsukamoto
sati rei kuroki
Yukinori Kuroki
Keywords:
Substrate (chemistry)
Plasma
Analytical chemistry
Inductively coupled plasma
Chemistry
si substrate
Materials science
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