EBiC-Based Drift Compensation for an Automated EBiD Fabrication Process

Electron beam induced depositions (EBiD) can be used as ultra-sensitive sensors. Their fabrication inside the SEM is accompanied with several technological challenges, especially the intrinsic drift issues caused by the exposure of the target sample to the electron beam. The sensitivity and potential of the EBiD sensors increases by downsizing, as are the fabrication challenges caused by drift. Standard methods are not adequate to compensate these drift effects sufficiently on this scale. By monitoring electron beam induced currents (EBiC) the drift can be estimated and compensated with an online technique, that does not interfere with the electron beam-based fabrication. Here, the idea, feasibility, and sensitivity of this technique are proposed and evaluated.