Carbon nanochannels elaborated by buckle delamination control on patterned substrates

Carbon nanochannels were achieved using lithographically patterned lines on a silicon substrate as a template to control the buckle delamination of highly equibiaxial compressively stressed thin films. Carbon films were synthesized by ionized physical vapor deposition through inductively coupled plasma magnetron sputtering. The obtained structures exhibit dimensions as small as 500nm wide and 80nm high, and may be used in nanofluidic applications. Results regarding the characterization of their growth mechanism and structural analyses by Raman microspectroscopy are presented.