An ultrafast-ultrafine scanning force photoconductive probe

Road-maps used by the semiconductor industry for device and circuit fabrication in United States and Japan have set targets for 0.1 micron design in general production by the year 2007. The need for increased temporal resolution on nanometric structures has led us to investigate the use of a scanning force microscope (SFM) with the added capability of picosecond-time-resolved waveform measurement. With this tool we are able to measure both nanometer dimensions and picosecond durations using a single probe.