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Recent Achievements in Sub-10 nm DSA Lithography for Line/Space Patterning
Recent Achievements in Sub-10 nm DSA Lithography for Line/Space Patterning
2017
Christophe Navarro
Celia Nicolet
Fumi Ariura
Xavier Chevalier
Kui Xu
Mary Ann Hockey
Muhammad Mumtaz
Guillaume Fleury
Georges Hadziioannou
Antoine Legrain
M. Zelsmann
Ahmed Gharbi
Raluca Tiron
Laurent Pain
Laura Evangelio
Marta Fernández-Regúlez
Francesc Pérez-Murano
Ian Cayrefourcq
Keywords:
Nanotechnology
Next-generation lithography
Lithography
Multiple patterning
Materials science
directed self assembly
Correction
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