Design space analysis of novel interconnect constructs for 22nm FDX technology
2017
In this paper, we describe an integrated design space analysis approach consisting of full factorial layout
generation, lithography simulations with added proximity effects, and rigorous statistical analysis through monte-carlo
simulations which is used in the evaluating interconnects. This agile Design rule development process provides a quick
turnaround time to down-select the potential layout configurations that can offer a competitive, robust and reliable
design and manufacturing. Further layout and placement optimization is carried out to evaluate intra-cell, inter-cell and
cell boundary situations, which are critical for a place and routed block. These interconnects developed using the
integrated approach has been the key contributor to give 20-30% higher performance at the same Iddq leakage for 8T
libraries compared to Single Diffusion break or Double Diffusion break based 12T libraries in 22FDX Technology.
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