International Workshop on Beam Injection Assessment of Defects in Semiconductors Held in Meudon-Bellevue (France) on 18-20 July 1988
1989
Abstract : Contents: SEM microcharacterization of semiconductors; Electron and photon-matter interaction; Modelling of the EBIC measurements of diffusion lengths and the recombination contrast; Minority carrier diffusion length: measurement; STEM-catholuminescence; Intrinsic or extrinsic origin of the recombinations at defects; LBIC quantitative mapping; Scanning DLTS; CL in laser heterojunctions; CL in quantum-wells; Electron and optical beam testing of integrated circuits. (rh)
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