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Enhanced density in a stabilized high-current plasma beam
Enhanced density in a stabilized high-current plasma beam
2020
X. J. Zheng
F. J. Gou
Yipo Zhang
H.X. Wang
Andrew Wallace
Hongbin Wang
Zhihui Huang
Xiao-Quan Ji
Zongbiao Ye
Shaoyong Liang
Junzhao Zhang
Na Wu
Yutao Feng
Bai Quan Deng
Keywords:
Optoelectronics
Materials science
high current
plasma beam
Correction
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