Liquid supplying apparatus

The invention provides a liquid supplying apparatus capable of preventing complication of the apparatus and rapidly discharging processing liquid when supplying the processing liquid to a process object. A reservoir chamber (23) for storing resist liquid and an ejecting port (21) for ejecting the resist integrally form a cartridge (12), the cartridge (12) is conveyed to a position right above a wafer (W), and the resist liquid is directly discharged from the cartridge (12). In addition, except the ejecting port (21) for discharging the resist liquid, a replenishing port (28) for replenishing the resist liquid into the cartridge (12) is provided. Besides, the standby unit (13) for placing the cartridge (12) is provided with a structure for replenishing the resist liquid into the cartridge (12).