Imaging control functions of optical scanners
2014
For future printing based on multiple patterning and directed self-assembly, critical dimension and overlay requirements
become tighter for immersion lithography. Thermal impact of exposure to both the projection lens and reticle expansion
becomes the dominant factor for high volume production. A new procedure to tune the thermal control function is
needed to maintain the tool conditions to obtain high productivity and accuracy. Additionally, new functions of both
hardware and software are used to improve the imaging performance even during exposure with high-dose conditions.
In this paper, we describe the procedure to tune the thermal control parameters which indicate the response of projection
lens aberration and reticle expansion separately. As new functionalities to control the thermal lens aberration, wavefront-based
lens control software and reticle bending hardware are introduced. By applying these functions, thermal focus
control can be improved drastically. Further, the capability of prediction of reticle expansion is discussed, including
experimental data from overlay exposure and aerial image sensor results.
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