A semiconductor substrate material for forming the passivation film, the passivation film of the semiconductor substrate and its manufacturing method, and a solar cell element and a manufacturing method

2012 
The present invention provides a method for forming a semiconductor substrate with a passivation film material, comprising a polymer compound having an anionic group or a cationic group.
    • Correction
    • Source
    • Cite
    • Save
    • Machine Reading By IdeaReader
    0
    References
    0
    Citations
    NaN
    KQI
    []