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Towards 18% efficiency on below 100µm thick multicrystalline silicon wafers from the RST process
Towards 18% efficiency on below 100µm thick multicrystalline silicon wafers from the RST process
2013
Fabrice De Moro
E. Jolivet
E. Tupin
R. Varrot
C. Bigot
B. Heilbronn
Philipp Keller
Sven Seren
Benjamin Albrecht
Giso Hahn
Keywords:
Wafer
Monocrystalline silicon
Composite material
Materials science
Optoelectronics
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