Plasma processor with temperature measuring device

The invention discloses a plasma processor, which comprises a reaction cavity. A base is located at the inner lower part of the reaction cavity for fixing a substrate; a radio frequency power supply is connected onto the lower electrode inside the base; a gas spraying head is located at the top part of the reaction cavity; the reaction cavity is internally provided with at least one component ready for temperature measurement; the component ready for temperature measurement comprises a first surface facing the substrate above the base and a second surface located on the back surface of the first surface; a heating plate and the second surface of the component ready for temperature measurement are mutually fastened at the component ready for temperature measurement; the heating plate comprises a through hole, the through hole is internally provided with a thermal couple and an elastic insulation material coating the outer surface of the thermal couple, the thermal couple comprises a first end and the first end and the second surface of the component ready for temperature measurement form a first contact area, the elastic insulation material also comprises a first end and the first end and the second surface of the component ready for temperature measurement form an annular contact area, and the annular contact area surrounds the first contact area.