Method and apparatus for coating substrates by means of vacuum evaporation

A process for coating substrates by means of vacuum vapor deposition, characterized in that during the coating at least one electron beam (7) in a heating zone (21) is directed at the deposited film material and the heating zone (21) at least partially sweeps through appropriate beam deflection so that the layer material is selectively heated, wherein the heating zone (21) within the coating zone (19), ie that area of ​​the substrate (13), in which the vaporous material is reflected, and / or an immediately subsequent neighboring zone (within a process opening 17).