Application of SIMS in semiconductor research

Nowadays SIMS is a well-established analytical technique in semiconductor research. Materials research and process development are the main fields of application in silicon technology, whereas for III–V compound semiconductors much attention has been paid to assessment of multilayer structures grown by advanced growth methods. Recent applications of SIMS in these fields are the subject of the present paper. Emphasis will be placed upon optimizing the SIMS results with respect to accuracy and depth resolution.