67-1: Novel LTPS Technology for Large Substrate

2016 
We developed Partial Laser Anneal Silicon (PLAS) TFT of novel LTPS technology for large substrate, which had the mobility of 28.1 cm2/Vs in bottom gate structure. Moreover there is no limit of substrate size, such as Gen10 and more. This innovative technology can enable the conversion from an α-Si TFT to a high mobility TFT most easily and inexpensively. Photo-stability of PLAS will be suitable to OLED backplane, HDR TV, and outdoor IDP.
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