Precursor composition for forming zirconium-containing thin film and method for preparing zirconium-containing thin film using the same
2016
Disclosed are a precursor composition for forming a zirconium-containing thin film and a method for forming a zirconium thin film using the same in manufacturing a semiconductor element. The precursor composition for forming a zirconium thin film comprises: a zirconium precursor compound expressed by chemical formula 1 below; and an organic compound uniformly mixed with the zirconium precursor compound. [Chemical formula 1] In chemical formula 1, R_1 is a linear or a branching alkyl group having a carbon number of 1 to 4, and each of R_2 and R_3 is a linear or a branching alkyl group having a carbon number of 1 to 6.
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