PRODUCTION OF FEMTOSECOND PULSES AND MICRON BEAM SPOTS FOR HIGH BRIGHTNESS ELECTRON BEAM APPLICATIONS

Current and future applications of high brightness electron beams, which include advanced accelerators and beam-radiation interactions require both transverse and longitudinal beam sizes on the order of tens of microns. Ultra-high density beams may be produced at moderate energy (50 MeV) by compression and subsequent strong focusing of low emittance, photoinjector sources. We describe the implementation of this method used at the PLEIADES inverse-Compton scattering (ICS) x-ray source at LLNL in which the photoinjector-generated beam has been compressed to 300 fsec rms duration using the velocity bunching technique and focused to 20 μm rms size using an extremely high gradient, permanent magnet quadrupole focusing system.