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Influence of organic surface chemistry on the nucleation of plasma deposited SiO x films
Influence of organic surface chemistry on the nucleation of plasma deposited SiO x films
2017
Christian Hoppe
Felix Mitschker
Ignacio Giner
T. de los Arcos
Peter Awakowicz
Guido Grundmeier
Keywords:
Nuclear magnetic resonance
Nucleation
Plasma
Inorganic chemistry
Chemistry
Analytical chemistry
Chemical engineering
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