Old Web
English
Sign In
Acemap
>
Paper
>
Mixing of Oxygen in Titanium Nitride Films Formed by Reactive HCD Ion Plating
Mixing of Oxygen in Titanium Nitride Films Formed by Reactive HCD Ion Plating
2000
Ken-ichi Miura
Itsuo Ishigami
Tomoyuki Mizukoshi
Keywords:
Ion plating
Oxygen
Inorganic chemistry
Titanium nitride
Metallurgy
Materials science
Nitride
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
1
Citations
NaN
KQI
[]