Chemical Mechanical Planarization of Copper: Role of Oxidants and Inhibitors

Investigations were carried out to understand the effect of hydrogen peroxide as an oxidant and benzotriazole (BTA) as an inhibitor on the chemical mechanical planarization (CMP) of copper. Cu-CMP was studied using electrochemistry and removal rate measurements in solutions containing the oxidizer and the inhibitor. In the presence of 0.1 M glycine, the copper removal rate was high in the solution containing 5% H 2 O 2 at pH 2 because of a Cu-glycine complexation reaction. The dissolution rate of Cu increased due to the formation of the highly soluble Cu-glycine complex in the presence of hydrogen peroxide. Addition of 0.01 M BTA in the solution containing 0.1 M glycine and 5% H 2 O 2 at pH 2 exhibited a reduction in the Cu removal rate by the formation of a Cu-BTA complex on the surface of copper that inhibits the dissolution. X-ray photoelectron spectroscopy and secondary-ion mass spectroscopy investigations revealed the formation of a Cu-glycine complex, which aided the understanding of the mechanism of Cu-oxidant-inhibitor interaction during polishing.