Microfabrication Technologies Applied To The Production Of Large Area Stress Relieved Multilayer Beamsplitters

Large area multilayer beamsplitters (1 cm 2 ) were produced for use at oblique incidence in the soft X-ray range. Mo/C multilayer reflectors were deposited on top of a self supporting silicon carbide carrier film. The role of the supporting film and the stress induced by the multilayer are addressed. Progress towards optimization of the flatness and transmission enhancement of the beamsplitters (thinning of the carrier layer and adjusting its stress through etching ) is presented. Experimental reflectivity and transmission results at 13.3 A are compared with theory.