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Characterization of Chemical Structure and Electrical Properties of Remote O2 Plasma Enhanced CVD SiO2/GaN(0001) structures
Characterization of Chemical Structure and Electrical Properties of Remote O2 Plasma Enhanced CVD SiO2/GaN(0001) structures
2017
Truyen NguyenXuan
Taoka Noriyuki
Ohta Akio
Yamada Hisashi
Takahashi Tokio
Ikeda Mitsuhisa
Makihara Katsunori
Shimizu Mitsuaki
Miyazaki Seiichi
Keywords:
Optoelectronics
Chemical structure
Plasma
Materials science
o2 plasma
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