Comparison of plasma-enhanced kinetics between floating and grounded states

Abstract There are increasing evidences that charges should make nanoparticles liquid-like or enhance diffusion in nanoparticles. Considering these, there is a possibility that plasma enhanced dewetting, which had been attributed to the bombardments of high energy electrons or ions, should be attributed to charges. In order to clarify whether plasma enhanced kinetics come from bombardments of electrons or ions or from the charge buildup, two series of experiments were made. One is the comparison of dewetting kinetics of Sn and Au films in the inductively-coupled plasma between floating and grounded states. The other is the comparison of recrystallization kinetics of the Fe-1%Si sheet sample in the inductively-coupled plasma between floating and grounded states. Both dewetting and recrystallization kinetics were much more enhanced in the floating state than in the grounded state. These results show that the charge buildup is responsible for the plasma enhanced kinetics.