Improved PECVD processed hydrogenated germanium films through temperature induced densification

Abstract Amorphous and nano-crystalline germanium is of potential interest for a wide range of electronic, optical, opto-electronic and photovoltaic applications. In this work the influence of deposition temperature on hydrogenated germanium (Ge:H) films was characterized, using over 200 Ge:H and over 70 SiGe:H films. The demonstrated temperature-induced densification of Ge:H films resulted in more stable films with a lower bandgap energy and dark conductivity and higher activation energy.