Micro/Nano Topography Measurement Device for Samples Under Coaxial Load

In order to solve the problem of micro/nano topography measurement of materials under load,an in-situ tensile test device was developed,which can be integrated with various measurement instruments to measure the micro/nano topography variations of the samples in the tensile process.The maximum strain of 400% and the maximum tensile force of 19.6 N can be achieved by the device for a sample 20 mm in length.With thin film as the sample,the variations in the micro/nano topography of the sample under the coaxial tensile load were studied and the corresponding strain-stress curve was obtained.The feasibility of the device was verified by experimental results.