Stroboscopic sampling applied to measurement of voltage waveforms. The output is integrated to the desired signal to noise ratio.

2017 
Ultrahigh speed electron beam pulsing systems for electron beam testingJohn T. L. Thong, Simon C. J. Garth, William C. Nixon, Alec N. BroersDepartment of Engineering, Cambridge University, Trumpington Street, Cambridge CB2 1PZ, EnglandAbstractMeasurement of high speed waveforms within operating integrated circuits presents a major challenge to design engineers. Electron beam testing techniques are well suited to the task due to their essentially non-loading properties. A number of such systems are briefly reviewed and their properties and drawbacks outlined. In addition, a recently developed system is described which overcomes some of the difficulties encountered with previous implementations.IntroductionElectron beam testing techniques are rapidly becoming established as a standard diagnostic tool for failure analysis, characterization and debugging of pre-production integrated circuits. The principal reason behind the rapid increase in interest in the subject during the last 5 years is the capability of the technique to measure waveforms on minimum- dimension features within integrated circuits in an almost totally non-loading and non- invasive manner. This compares favourably with the more conventional technique of mechanical probing which is both damaging and significantly loading on small geometry device elements.An important area of application of electron beam testing techniques is that of measuring high speed signals within integrated circuits. The electron probe offers negligible capacitance to the device under test thus ensuring that the device operates identically irrespective of whether it is being measured or not. Additionally, the electron beam may be pulsed very rapidly allowing measurements with very high temporal resolution.VoltageElectron beam pulse or sampling gateOutput-I
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