Projection exposure apparatus, the projection exposure method and the use of a projection lens

has a projection exposure apparatus for exposing a arranged in the region of an image surface of a projection objective radiation-sensitive substrate with at least one image of a arranged in the region of an object surface of the projection objective pattern of a mask a light source for emitting ultraviolet light of a wavelength band having a bandwidth Δλ> 10 pm around a central Arbeitswelenlange λ> 200 nm; a Bleuchtungssystem for receiving the light from the light source and for forming the pattern of the mask directed illumination radiation, and a projection lens for imaging the pattern of the mask onto a photosensitive substrate. The projection objective is a catadioptric projection objective having at least one concave mirror.