Method for manufacturing cliche for offset printing and cliche for offset printing

Provided are a method for manufacturing a cliche for offset printing, and a cliche for offset printing manufactured using the method. The method for manufacturing a cliche for offset printing comprises the steps of: forming a light-shielding mask pattern on a substrate; forming a negative photo-resist layer on the substrate having the light-shielding mask pattern formed thereon; exposing the negative photo-resist layer to light by applying the light to the substrate; and forming a negative photo-resist pattern layer having a protruding embossed portion and a developed groove pattern by making the exposed negative photo-resist layer subjected to developing, wherein the negative photo-resist layer has an average thickness of 3μm or more, the negative photo-resist pattern layer has at least two types of groove patterns having different line-widths, and the at least two types of groove patterns have a line-width difference of 10μm or more therebetween and are connected with each other.