Novel method for fabricating waveguide grating by phase mask technique

We report the fabrication of waveguides gratings coupler in photoresist by using a volume holographic gratings and that of the holographic gratings by Red Sensitive Photopolymer at 632.8 nm. The holographic gratings can produce diffracted light of 0 and -1 orders with equal intensity. The two diffracted light beams yield the interference fringe of period in near field, which is as laser sources to expose the photoresist on waveguide.