Composite metal/C:H films prepared by unbalanced magnetron sputtering: Ni/C:H

Abstract Composite Ni/C:H films were prepared in two ways: using a working gas mixture butane/Ar in a closed field unbalanced twin magnetron system powered by 40 kHz voltage and using n-hexane/Ar mixture also in an unbalanced planar magnetron system with RF powered substrate support that could provide additional dc negative bias. General electrical and optical properties, morphology observed by TEM and composition by XPS of Ni/C:H films are described. Because the films showed ageing in the morphology and in dc electrical resistance a more detailed study of this phenomenon in case of Ni/C:H films deposited by dc unbalanced magnetron using n-hexane/Ar mixture was performed. These films were compared to those prepared when additional dc negative bias up to − 300 V was imposed during deposition. Qualitative explanation of the ageing is proposed.