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Highly charged ion beam applied to lithography technique (invited)
Highly charged ion beam applied to lithography technique (invited)
2008
S. Momota
Y. Nojiri
Jun Taniguchi
Iwao Miyamoto
Noboru Morita
Noritaka Kawasegi
Keywords:
Highly charged ion
Ion beam
Lithography
Kinetic energy
Beam (structure)
Spin glass
Atomic physics
Physics
Nanolithography
Ion beam lithography
Etching
Nanotechnology
Silicon
Correction
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