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Focus and CD control by scatterometry measurements for 65/45nm node devices
Focus and CD control by scatterometry measurements for 65/45nm node devices
2009
Kawachi
Fudo
Yamashita
Yamamoto
Narimatsu
Matsumoto
Miwa
Keywords:
Node (networking)
shape control
lithography process
Optoelectronics
Focus (computing)
Computer science
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