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Evaluation of Growth and Cleaning Rates of Chamber-Wall Deposition during Silicon Gate Etching
Evaluation of Growth and Cleaning Rates of Chamber-Wall Deposition during Silicon Gate Etching
2013
Junichi Tanaka
Kenji Shiraishi
Keywords:
Dry etching
Analytical chemistry
Plasma processing
Etching (microfabrication)
Materials science
Inorganic chemistry
Etching
Reactive-ion etching
Silicon
Deposition (law)
Correction
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