Studies of topological features of the surface relief formation of titanium nitride films on silicon substrates during the diffusion mass transfer and on annealing using scanning tunneling microscopy

The special features of the structure and properties of nanostructural titanium nitride films on silicon substrates have been considered and a physicomathematical model of the formation of their surface relief has been constructed on the basis of the deformation theory. A dependence of the wavelength of the surface corrugation on the film thickness has been established. The topography of the surface relief formed as a result of a diffusion mass transfer and changed on annealing has been examined. The amplitude of corrugations formed has been defined.