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Cost of ownership/yield enhancement of high volume immersion lithography utilizing topcoat-less resists
Cost of ownership/yield enhancement of high volume immersion lithography utilizing topcoat-less resists
2010
Khorram
Nakano
Sagawa
Ishii
Fujiwara
Iriuchijima
Keywords:
Resist
Optoelectronics
Throughput (business)
cost of ownership
Semiconductor device modeling
Lithography
Yield (engineering)
Materials science
Contact angle
Immersion lithography
Correction
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