Silver-based alloy target material blank for vacuum magnetron sputtering and preparation method as well as application thereof

The invention belongs to the technical field of metal material processing, and particularly relates to a silver-based alloy target material blank for vacuum magnetron sputtering and a preparation method as well as application thereof. The silver-based alloy target material blank comprises, by weight percentage, 98.26wt%-99.465wt% of metallic silver and 0.535wt%-1.74wt% of other alloying elements, wherein the other alloying elements comprise at least one of the following elements: copper, yttrium, nickel, cerium, zinc, aluminum, magnesium, neodymium, silicon and the like. According to different alloy proportions and the preparation method, the produced silver-based target material has excellent performances such as good vulcanization resistance and low resistivity, and the silver-based target material blank is applied to the vacuum magnetron sputtering after being processed.