Room-temperature crystallization of amorphous thin films by RF plasma treatment

Hisashi Ohsaki,Yuko Shibayama,Akira Kinbara,Takashi Watanabe,K. Fukuhisa,K. Shinohara,Akira Nakajima

Room-temperature crystallization of amorphous thin films by RF plasma treatment

2004

Hisashi Ohsaki
Yuko Shibayama
Akira Kinbara
Takashi Watanabe
K. Fukuhisa
K. Shinohara
Akira Nakajima

The crystallization of amorphous thin films was achieved by plasma treatment without heating. The gas pressure on the plasma treatment was found to be the key parameter on the crystallization.

Keywords:

Crystallization
Amorphous solid
Plasma
Thin film
Carbon film
Materials science
Inorganic chemistry
Analytical chemistry
Physical vapor deposition
Refractive index
X-ray crystallography
Chemical engineering
plasma treatment

Correction
Source
Cite
Save
Machine Reading By IdeaReader

References

Citations