Depth profiling by ion-beam analysis

In an ion-beam analysis, a sample is bombarded with charged-particle beams and characteristic X-rays (PIXE), nuclear γ-rays (PIGE) or charged particles produced in the target material are measured. A method for deducing a concentration depth profile of an element in the sample from a yield curve of these reaction products as a function of the projectile energy is derived on the basis of the least-squares method. Validity of this method is demonstrated taking an example of PIXE.