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Formation of shallow junctions for VLSI by ion implantation and rapid thermal annealing
Formation of shallow junctions for VLSI by ion implantation and rapid thermal annealing
1988
Oeztuerk
Keywords:
Polycrystalline silicon
Ion implantation
Radiation effect
Annealing (metallurgy)
Very-large-scale integration
Radiation damage
Electronic engineering
Composite material
Materials science
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